Scanning Electron Microscope Equipment

Scanning Electron Microscopy (SEM) and
X-ray Energy Dispersive Spectroscopy

1.Instruments

Scanning Electron Microscopy (SEM), Model 501, Philips - Holland with EDAX and EBIC attachments.

    • The scanning electron microscope (SEM) is used for imaging of surfaces and analysis of small surface features. It provides magnifications of up to 240,000 and high spatial resolution (Guaranteed 6 nm in the secondary electron mode, Al-Au-sputtered specimen).
    • Completely PC control upgrade by WinDISS card and software from Pointelectronic GmbH: mesurements of distances, angles, areas, etc. Output files in BMP and TIFF formants.
    • High tension accelerating voltage continuously variable from 1.6 kV to 30 kV.
    • Dynamic focus
    • Scan coils control: of scan rotation, tilt correction and magnification
    • Contrast enhancement via electronic image signal differentiation and gamma correction.
    • High resolution 7” picture monitor + Polaroid camera.
    • TV output for videotape (CCIR B&W) or second monitor.
    • Two eucentric Goniometer free working distances: 34 mm (normal working distance) and 12 mm (high resolution working distance)
    • 64 pin electrical vacuum feedthrough for electron beam induced current (EBIC) inspection of microelectronic devices or other biasing techniques.

    The SEM is operated in several modes:

      1. Secondary electrons (SE) for topographical imaging.2. Backscattered electrons (BE) for phase and chemical compositional imaging.

      3. Electron beam induced current (EBIC) for defect analysis in semiconductor devices.

      4. Energy dispersive x-ray spectroscopy (EDXS)- for chemical elemental analysis.

    With SEM a topographical picture (SE) of the surface can be obtained together with a phase chemical (BE) composition picture and elemental chemical (EDXS) analysis mapping at selected points on the surface. These features help to elucidate different problems in R&D of new materials and devices, process and quality control, failure analysis, etc.

    Fig. 1 Cross section picture taken from an IC with an "old" Philips 501 SEM (W- electron source) @ 50,000X Magnification and WinDISS Digital System at El-Sol Laboratories, Natanya, Israel.

    Fig. 1 Cross section picture taken from an IC with an "old" Philips 501 SEM (W- electron source) @ 50,000X Magnification and WinDISS Digital System at El-Sol Laboratories, Natanya, Israel.

    Scanning Electron Microscope Technique

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